Study of 3-D effects in BOX isolation technologies
Authors
School of Computer Science and Engineering
UNSW,
Sydney 2052, Australia
Abstract
This paper reports on three-dimensional simulation of BOX isolation technologies in order to quantify the leakage currents due to the contribution of the lateral and vertical parasitic MOSFETs formed in conjunction with trench isolation. A new mode of leakage current cuased by intrinsic 3-D effects is described which may pose serious problems for future scaling of the minimum n+ to p+ spacing.
BibTeX Entry
@inproceedings{Noell_HPO_91, address = {Zurich, Switzerland}, author = {Matthew Noell and Gernot Heiser and Steve Poon and Marius Orlowski}, booktitle = {International Conference on Simulation of Semiconductor Devices and Processes}, pages = {331--340}, paperUrl = {https://trustworthy.systems/publications/papers/Noell_HPO_91.pdf}, publisher = {Hartung-Gorre Verlag, Konstanz, Germany}, title = {Study of 3-{D} Effects in {BOX} Isolation Technologies}, year = {1991} }