Study of 3-D effects in BOX isolation technologies
Authors
School of Computer Science and Engineering
UNSW,
Sydney 2052, Australia
Abstract
This paper reports on three-dimensional simulation of BOX isolation technologies in order to quantify the leakage currents due to the contribution of the lateral and vertical parasitic MOSFETs formed in conjunction with trench isolation. A new mode of leakage current cuased by intrinsic 3-D effects is described which may pose serious problems for future scaling of the minimum n+ to p+ spacing.
BibTeX Entry
@inproceedings{Noell_HPO_91,
address = {Zurich, Switzerland},
author = {Matthew Noell and Gernot Heiser and Steve Poon and Marius Orlowski},
booktitle = {International Conference on Simulation of Semiconductor Devices and Processes},
pages = {331--340},
paperUrl = {https://trustworthy.systems/publications/papers/Noell_HPO_91.pdf},
publisher = {Hartung-Gorre Verlag, Konstanz, Germany},
title = {Study of 3-{D} Effects in {BOX} Isolation Technologies},
year = {1991}
}
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